Probe:	SAH2aSV
Probe preparation:	Antisense labelled with S35 RNA
Visualized with:	Autoradiography

Structure	Level	Pattern	Image	Note
TS15: future forebrain	Present	Regionally restricted	3A/B	Expression regionally localized within the ventral prosencephalon.
TS15: future spinal cord	Present	Regionally restricted	3A/B	Authors report two bilaterally symmetrical stripes of expression throughout the entire length of the spinal cord.

Structure	Level	Pattern	Image	Note
TS17: diencephalon	Present	Regionally restricted	3C	Expression within the posterior diencephalon.

Structure	Level	Pattern	Image	Note
TS17: hindbrain	Present	Regionally restricted	3D	Expression within specific regions in the dorsal mesencephalon, ventral metencephalon and myelencephalon.
TS17: midbrain	Present	Regionally restricted	3D	Expression within specific regions in the dorsal mesencephalon, ventral metencephalon and myelencephalon.
TS17: future spinal cord	Present	Regionally restricted	3D	Authors state that expression in the brain is continuous with the two stripes of expression in the spinal cord.

Structure	Level	Pattern	Image	Note
TS17: diencephalon	Present	Regionally restricted	3E	Expression within the posterior diencephalon, as well as specific regions in the dorsal mesencephalon, and ventral myelencephalon.
TS17: hindbrain	Present	Regionally restricted	3E	Expression within the posterior diencephalon, as well as specific regions in the dorsal mesencephalon, and ventral myelencephalon.
TS17: midbrain	Present	Regionally restricted	3E	Expression within the posterior diencephalon, as well as specific regions in the dorsal mesencephalon, and ventral myelencephalon.

Structure	Level	Pattern	Image	Note
TS17: future spinal cord	Present	Regionally restricted	3F	Two bilaterally symmetrical stripes of expression consisting of 4-6 cell layers along the lateral axis within the spinal cord.

Structure	Level	Pattern	Image	Note
TS19: telencephalon	Absent		4A/B
TS19: midbrain	Present	Regionally restricted	4A/B	Expression in the dorsolateral wall of the mesencephalon, which gives rise to the superior and inferior colliculi.
TS19: future spinal cord	Present		4A/B

Structure	Level	Pattern	Image	Note
TS19: diencephalon	Present	Regionally restricted	4C	Expression in a band of cells spanning the diencephalon, first detected in the anterior wall of the diencephalon at the level of the cranial flexure.
TS19: metencephalon	Present	Regionally restricted	4C	Continuous expression through the dorsal metencephalon.

Structure	Level	Pattern	Image	Note
TS19: diencephalon	Present	Regionally restricted	4D	Expression in a band of cells in the posterior wall of the diencephalon, in the anlage of the hypothalamus.
TS19: myelencephalon	Present	Regionally restricted	4D	Expression through the ventral myelencephalon.

Structure	Level	Pattern	Image	Note
TS19: myelencephalon	Present	Regionally restricted	4E	Expression through the ventral myelencephalon.
TS19: future spinal cord	Present	Regionally restricted	4E	Stripes of expression in the spinal cord immediately dorsal to the ventral horns and ventral to the sulcus limitans.

Structure	Level	Pattern	Image	Note
TS20: diencephalon	Present	Regionally restricted	4G	Expression in the diencephalon first detected in the anterior wall of the diencephalon at the level of the cranial flexure.

Structure	Level	Pattern	Image	Note
TS20: diencephalon	Present		4H
TS20: metencephalon	Present		4H

Structure	Level	Pattern	Image	Note
TS20: diencephalon	Present	Regionally restricted	4I	Expression in a band of cells spanning the diencephalon.
TS20: midbrain	Present	Regionally restricted	4I	Expression in the dorsolateral wall of the mesencephalon, which gives rise to the superior and inferior colliculi.

Structure	Level	Pattern	Image	Note
TS20: metencephalon	Present	Regionally restricted	4J	Continuous expression through the dorsal metencephalon. Posterior to the rhombencephalic isthmus, expression switches from the dorsal metencephalon to the ventral side.

Structure	Level	Pattern	Image	Note
TS20: hypothalamus	Present		4K	Expression in a band of cells in the posterior wall of the diencephalon, in the anlage of the hypothalamus.
TS20: medulla oblongata	Present	Regionally restricted	4K	Expression through the ventral myelencephalon.

Structure	Level	Pattern	Image	Note
TS20: hypothalamus	Present		4L	Expression in a band of cells in the posterior wall of the diencephalon, in the anlage of the hypothalamus.
TS20: medulla oblongata	Present	Regionally restricted	4L	Expression through the ventral myelencephalon.
TS20: telencephalon	Present	Regionally restricted	4L	Two dorsoventrally oriented stripes in the lateral walls of the telencephalon, less intense than in the diencephalon, in regions of the telencephalon giving rise to part of the basal ganglia and cortical neurons at the lateral cerebral walls.

Structure	Level	Pattern	Image	Note
TS20: telencephalon	Present	Regionally restricted	4M	Two dorsoventrally oriented stripes in the lateral walls of the telencephalon.

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Regionally restricted	4N	Two thin stripes of expression running through the entire length of the spinal cord.

Structure	Level	Pattern	Image	Note
TS20: spinal cord	Present	Regionally restricted	4O	Two stripes of expression running through the entire length of the spinal cord, immediately dorsal to the ventral horn and ventral to the sulcus limitans. Authors state the expression is slightly different in the anterior and posterior spinal cord.