Probe:	Bmp4 probe28
Probe preparation:	Antisense labelled with digoxigenin RNA
Assay notes:	Fixative for sectioned specimens: SERA (60% ethanol, 30% formaldehyde 37%, 10% acetic acid).

Structure	Level	Pattern	Image	Note
TS15: fronto-nasal process ectoderm	Present	Regionally restricted	4S	Expression is in the ectoderm around the nasal pits with stronger expression on the oral side and almost no expression on the opposite side.
TS15: 1st branchial arch maxillary component ectoderm	Present	Regionally restricted	4S	Expression is in the distal ectoderm.

Structure	Level	Pattern	Image	Note
TS17: nasal process	Present	Regionally restricted	4T	Expression is in the ectoderm around the nasal pits with stronger expression on the oral side and almost no expression on the opposite side.
TS17: 1st branchial arch maxillary component ectoderm	Present	Regionally restricted	4T	Expression is in the distal ectoderm.

Structure	Level	Pattern	Image	Note
TS17: nasal process	Present	Regionally restricted	4U	Expression is in the ectoderm around the nasal pits with stronger expression on the oral side and almost no expression on the opposite side.

Structure	Level	Pattern	Image	Note
TS17: 1st branchial arch maxillary component ectoderm	Present	Regionally restricted	4V	Expression is in the distal ectoderm.

Structure	Level	Pattern	Image	Note
TS19: palatal shelf	Weak	Regionally restricted	4W	Expression is in the primary palate and in the anterior half of the forming secondary palate.

Structure	Level	Pattern	Image	Note
TS20: primary palate	Present	Regionally restricted	4X	Expression is in the primary palate and in the anterior half of the forming secondary palate.