Probe:	Gja1 cDNA2
Probe preparation:	Antisense RNA

Structure	Level	Pattern	Image	Note
TS13: future brain neural fold	Present		3A
TS13: future midbrain	Present		3A
TS13: future hindbrain	Strong	Regionally restricted	3A	Expression is anterior to the pre-otic sulcus at the rhombomere 2/3 boundary.
TS13: head	Strong	Regionally restricted	3A	Expression is in the craniofacial region.
TS13: rhombomere 2	Strong		3A
TS13: rhombomere 3	Strong		3A
TS13: future prosencephalon	Strong	Regionally restricted	3A	Expression is in the most anterior portion surrounding the optic pits.
TS13: future spinal cord neural fold	Strong	Regionally restricted	3A	Expression is at tye caudal neural pore.

Structure	Level	Pattern	Image	Note
TS13: future prosencephalon	Present	Regionally restricted	3B	Expression is surrounding the optic pits.
TS13: future brain neural fold	Present		3B

Structure	Level	Pattern	Image	Note
TS15: 1st branchial arch mandibular component	Strong		3C
TS15: 1st branchial arch maxillary component	Strong		3C
TS15: 2nd branchial arch	Strong		3C
TS15: branchial arch	Present		3C
TS15: fronto-nasal process	Present		3C

Structure	Level	Pattern	Image	Note
TS15: 1st branchial arch mandibular component	Strong		3D
TS15: 1st branchial arch maxillary component	Strong		3D
TS15: 2nd branchial arch	Strong		3D
TS15: branchial arch	Present		3D
TS15: fronto-nasal process	Present		3D

Structure	Level	Pattern	Image	Note
TS17: eye	Strong		3E
TS17: latero-nasal process	Strong		3E	Stronger expression in the most posterior regions surrounding the nasal pit.
TS17: medial-nasal process	Strong		3E	Stronger expression in the most posterior regions surrounding the nasal pit.
TS17: 1st branchial arch mandibular component	Present	Graded	3E	Expression was highest towards the midline.

Structure	Level	Pattern	Image	Note
TS17: latero-nasal process	Strong		3F	Stronger expression in the most posterior regions surrounding the nasal pit.
TS17: medial-nasal process	Strong		3F	Stronger expression in the most posterior regions surrounding the nasal pit.
TS17: 1st branchial arch mandibular component	Present	Graded	3F	Expression was highest towards the midline.

Structure	Level	Pattern	Image	Note
TS21: incisor	Very strong		3G
TS21: molar	Very strong		3G

Structure	Level	Pattern	Image	Note
TS22: palatal shelf	Strong		3H	Strong expression while undergoing fusion.

Structure	Level	Pattern	Image	Note
TS15: limb	Very strong		4A
TS15: somite	Very strong		4A

Structure	Level	Pattern	Image	Note
TS17: limb	Present	Regionally restricted	4B	Expression is in a broad diffuse domain.

Structure	Level	Pattern	Image	Note
TS19: apical ectodermal ridge	Present		4C

Structure	Level	Pattern	Image	Note
TS20: limb	Present	Regionally restricted	4D	Expression is in the most distal portion in the apical ectodermal ridge.
TS20: limb interdigital region	Weak		4D

Structure	Level	Pattern	Image	Note
TS21: digit epithelium	Present		4E	Expression was stronger at the distal portion.

Structure	Level	Pattern	Image	Note
TS22: limb digit	Present	Regionally restricted	4F	Expression is on the ventral and dorsal surfaces.
TS22: hair follicle	Present	Regionally restricted	4F	Expression is in follicles of the wrist.

Structure	Level	Pattern	Image	Note
TS23: limb digit	Present	Regionally restricted	4G	Expression is on the ventral and dorsal surfaces. `
TS23: hair follicle	Present	Regionally restricted	4G	Expression is in follicles of the wrist.

Structure	Level	Pattern	Image	Note
TS21: palatal shelf	Absent

Structure	Level	Pattern	Image	Note
TS23: primary palate	Absent

Structure	Level	Pattern	Image	Note
TS20: vibrissa follicle	Present